Advanced Electronic Materials,
Год журнала:
2024,
Номер
unknown
Опубликована: Июль 28, 2024
Abstract
There
is
a
growing
interest
in
exploring
nanometer‐thin
2D
oxide
semiconductor
transistors
for
future
scaled
and
multifunctional
(e.g.,
ultraflexible
high
transparency)
devices.
However,
further
development
hindered
due
to
the
degraded
device
performance
with
channels
use
of
costly
vacuum‐based
techniques.
Here,
(2.7
nm
thick)
c‐axis‐aligned
crystalline
In─S─O
channel
material
processed
from
aqueous
solution
reported.
The
based
on
Si/SiO
2
substrates
exhibit
mobility
(
µ
)
22.15
cm
V
−1
s
,
on/off
current
ratio
I
/
off
≈10
7
good
bias
stress
stability.
Detailed
investigations
show
that
this
achievement
attributed
highly
structure,
well‐designed
material,
atomically
smooth
surface.
Furthermore,
integrated
an
sol‐gel‐derived
6
thick
high‐
k
ZrO
insulator.
all‐aqueous‐solution‐based
quasi‐2D
In─S─O/ZrO
devices
15.65
─1
low
operating
voltage
1.5
V.
This
wide‐bandgap
opens
tremendous
opportunities
multifunctional,
ultra‐scaled
low‐cost
electronics.
ACS Applied Materials & Interfaces,
Год журнала:
2023,
Номер
15(40), С. 47394 - 47404
Опубликована: Сен. 27, 2023
Liquid
metal-electrolyte
can
offer
electrochemically
reducing
interfaces
for
the
self-deposition
of
low-dimensional
nanomaterials.
We
show
that
implementing
such
from
multiprecursors
is
a
promising
pathway
achieving
nanostructured
films
with
combinatory
properties
and
functionalities.
Here,
we
explored
liquid
metal-driven
interfacial
growth
metal
tellurides
using
eutectic
gallium-indium
(EGaIn)
as
cation
pairs
Ag+-HTeO2+
Cu2+-HTeO2+
precursors.
At
EGaIn-electrolyte
interface,
precursors
were
reduced
self-deposited
autogenously
to
form
interconnected
nanoparticle
networks.
The
deposited
materials
consisted
telluride
tellurium
their
relative
abundance
depending
on
ion
type
(Ag+
Cu2+)
metal-to-tellurium
ratios.
When
used
electrode
modifiers,
synthesized
increased
electroactive
surface
area
unmodified
electrodes
by
over
10
times
demonstrated
remarkable
activity
model
electrochemical
reactions,
including
HexRu(III)
responses
dopamine
sensing.
Our
work
reveals
potential
metal-templated
deposition
method
synthesizing
complex
material
systems
applications.
The Journal of Physical Chemistry C,
Год журнала:
2024,
Номер
128(12), С. 5355 - 5365
Опубликована: Март 16, 2024
In
our
study,
we
introduce
a
novel
concept
concerning
the
formation
of
oxygen
vacancies
at
varying
temperatures
during
oxide
skin
in
liquid
metal.
Specifically,
by
adjusting
2D-InOx
printing
temperatures,
successfully
regulated
concentration
specific
defects,
unveiling
decrease
higher
temperatures.
Employing
comprehensive
suite
analytical
techniques,
present
swift
and
efficient
method
for
producing
while
simultaneously
evaluating
its
internal
defect
content
both
macroscopic
microscopic
levels.
Furthermore,
employed
electron
energy
loss
spectroscopy
(EELS)
scans
proximity
grain
boundaries,
enabling
us
to
effectively
probe
fluctuation
vacancy
between
these
boundaries
interior
grains.
Our
findings
underscore
notable
accumulation
boundaries.
Notably,
capacity
manipulate
through
temperature
adjustments
enhances
significance
investigation,
offering
valuable
insights
into
2D
memristor
materials
their
potential
role
development
memory
devices
based
on
2D-InOx.
Nanoscale,
Год журнала:
2024,
Номер
16(28), С. 13551 - 13561
Опубликована: Янв. 1, 2024
Interactions
between
solvents
with
surface
Sn
atoms
are
unravelled
experimentally
and
theoretically
for
impacting
the
electronic
properties
of
2D
SnO
2
nanosheets.
Advanced Electronic Materials,
Год журнала:
2024,
Номер
unknown
Опубликована: Июль 28, 2024
Abstract
There
is
a
growing
interest
in
exploring
nanometer‐thin
2D
oxide
semiconductor
transistors
for
future
scaled
and
multifunctional
(e.g.,
ultraflexible
high
transparency)
devices.
However,
further
development
hindered
due
to
the
degraded
device
performance
with
channels
use
of
costly
vacuum‐based
techniques.
Here,
(2.7
nm
thick)
c‐axis‐aligned
crystalline
In─S─O
channel
material
processed
from
aqueous
solution
reported.
The
based
on
Si/SiO
2
substrates
exhibit
mobility
(
µ
)
22.15
cm
V
−1
s
,
on/off
current
ratio
I
/
off
≈10
7
good
bias
stress
stability.
Detailed
investigations
show
that
this
achievement
attributed
highly
structure,
well‐designed
material,
atomically
smooth
surface.
Furthermore,
integrated
an
sol‐gel‐derived
6
thick
high‐
k
ZrO
insulator.
all‐aqueous‐solution‐based
quasi‐2D
In─S─O/ZrO
devices
15.65
─1
low
operating
voltage
1.5
V.
This
wide‐bandgap
opens
tremendous
opportunities
multifunctional,
ultra‐scaled
low‐cost
electronics.