Film‐Based Multi‐Photon Lithography for Efficient Printing of Electromagnetic Surface Structures DOI Creative Commons
Gordon Zyla, Savvas Papamakarios, Dimitrios C. Zografopoulos

и другие.

Advanced Materials Technologies, Год журнала: 2025, Номер unknown

Опубликована: Фев. 6, 2025

Abstract This study introduces an approach, termed film‐based multi‐photon lithography (MPL), for the efficient fabrication of electromagnetic surface structures. Unlike conventional MPL, which utilizes droplet‐shaped photosensitive volumes 3D structures, this method employs thin films to minimize influence axial voxel dimensions. modification enables rapid printing 2D structures over large areas with dry objective lenses, achieving feature sizes as small 250 nm. The versatility MPL is demonstrated through terahertz metasurfaces featuring metallized split‐ring resonators on glass substrates, well mid‐infrared comprising dielectric pillars silicon‐on‐insulator substrates. These are successfully produced spanning cm 2 and mm using a hybrid organic–inorganic photoresist within maximum processing time h. Particularly organic‐inorganic photoresists, additional post‐processing via calcination shows significant potential producing purely inorganic periodic reduced sizes. Moreover, high‐resolution 2.5D challenging achieve lithographic methods. Experimental results analyzed profilometry, scanning electron microscopy, Fourier transform infrared spectroscopy, energy‐ dispersive X‐ray while simulations confirmed responses metasurfaces.

Язык: Английский

Film‐Based Multi‐Photon Lithography for Efficient Printing of Electromagnetic Surface Structures DOI Creative Commons
Gordon Zyla, Savvas Papamakarios, Dimitrios C. Zografopoulos

и другие.

Advanced Materials Technologies, Год журнала: 2025, Номер unknown

Опубликована: Фев. 6, 2025

Abstract This study introduces an approach, termed film‐based multi‐photon lithography (MPL), for the efficient fabrication of electromagnetic surface structures. Unlike conventional MPL, which utilizes droplet‐shaped photosensitive volumes 3D structures, this method employs thin films to minimize influence axial voxel dimensions. modification enables rapid printing 2D structures over large areas with dry objective lenses, achieving feature sizes as small 250 nm. The versatility MPL is demonstrated through terahertz metasurfaces featuring metallized split‐ring resonators on glass substrates, well mid‐infrared comprising dielectric pillars silicon‐on‐insulator substrates. These are successfully produced spanning cm 2 and mm using a hybrid organic–inorganic photoresist within maximum processing time h. Particularly organic‐inorganic photoresists, additional post‐processing via calcination shows significant potential producing purely inorganic periodic reduced sizes. Moreover, high‐resolution 2.5D challenging achieve lithographic methods. Experimental results analyzed profilometry, scanning electron microscopy, Fourier transform infrared spectroscopy, energy‐ dispersive X‐ray while simulations confirmed responses metasurfaces.

Язык: Английский

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