
Crystal Growth & Design, Год журнала: 2025, Номер unknown
Опубликована: Май 29, 2025
Язык: Английский
Crystal Growth & Design, Год журнала: 2025, Номер unknown
Опубликована: Май 29, 2025
Язык: Английский
Опубликована: Янв. 1, 2025
Язык: Английский
Процитировано
0Journal of Colloid and Interface Science, Год журнала: 2025, Номер 687, С. 507 - 517
Опубликована: Фев. 13, 2025
Язык: Английский
Процитировано
0Inorganic Chemistry, Год журнала: 2025, Номер unknown
Опубликована: Март 19, 2025
The unclear assembly mechanism seriously hinders the preparation and application of 3d-4f heterometallic clusters. Two new nanoclusters [Dy2Mn4(HL)4(OAc)6]·5EtOH·H2O (1) [Gd2Mn4(HL)4(OAc)6]·4EtOH·4H2O (2) were obtained from in situ condensation reaction 3-amino-1,2-propanediol with 2-hydroxy-1-naphthaldehyde. intermediate species cluster 1 synthesis process tracked by time-dependent high-resolution electrospray ionization mass spectrometry (HRESI-MS), further revealing possible formation (Dy → DyL2 →DyMn2L2 DyMn3L2 DyMn4L3 Dy2Mn4L4). Magnetic studies indicated that antiferromagnet LnIII-MnII (Ln = DyIII GdIII) interaction was operative both titled Furthermore, performance clusters regulated adjusting type rare earth ions (DyIII GdIII). research results showed 2 containing GdIII exhibited an excellent longitudinal relaxation rate (r1) 1.95 mM-1 s-1 under 0.5 T a relatively suitable r2/r1 value (3.88), which it can be used as efficient T1 MR contrast agent. Cluster displayed antipathogenic activities against clinical MRSA strain MIC 32 μg/mL. This work not only provided reference for but also confirmed its potential biomedical field.
Язык: Английский
Процитировано
0Inorganic Chemistry Communications, Год журнала: 2025, Номер unknown, С. 114383 - 114383
Опубликована: Март 1, 2025
Язык: Английский
Процитировано
0Materials Today Chemistry, Год журнала: 2025, Номер 46, С. 102713 - 102713
Опубликована: Апрель 22, 2025
Язык: Английский
Процитировано
0Nano Letters, Год журнала: 2025, Номер unknown
Опубликована: Апрель 30, 2025
The advancement of integrated circuit manufacturing has continuously relied on lithography technology as a fundamental driving force. However, the development photoresists faces resolution-line edge roughness-sensitivity (RLS) trade-off, hindering simultaneous optimization. To address this issue, we propose collaborative strategy for heterogeneous isomorphism cluster with different radiation responses. Ti4M4-oxo platform [Ti4Zr4O6(OBu)4(OMc)16] (T4Z4), higher sensitivity, was applied photosensitizer resolution photoresist [Ti4Hf4O6(OBu)4(OMc)16] (T4H4), allowing hybrid to effectively induce cross-linking at low exposure doses, synergistically producing high-resolution patterns. This achieved an e-beam enhancement from 16 7.5 nm, successful fabrication intricate patterns under 10 nm. also exhibits capability etch transfer below 20 nm onto silicon dioxide substrates, highlighting its potential future device manufacturing. work presents new perspective design tackle RLS trade-off limitations.
Язык: Английский
Процитировано
0Crystal Growth & Design, Год журнала: 2025, Номер unknown
Опубликована: Май 29, 2025
Язык: Английский
Процитировано
0