Single-oxidant
slurries
are
prevalently
utilized
in
chemical
and
mechanical
polishing
(CMP)
of
4H-SiC
crystal.
Nevertheless,
it
is
a
challenge
to
achieve
high
material
removal
rate
(MRR)
surface
quality
using
single
oxidant
meet
the
needs
global
planarization
damage-free
nanoscale
processing
SiC
wafers.
To
solve
this
challenge,
novel
method
proposed
for
CMP
double
slurry.
This
slurry
mainly
consists
alumina
(Al
Journal of Physics D Applied Physics,
Год журнала:
2024,
Номер
58(2), С. 023004 - 023004
Опубликована: Окт. 8, 2024
Abstract
During
the
past
decades,
high-performance
devices
and
setups
have
been
widely
used
in
fields
of
precision
optics,
semiconductors,
microelectronics,
biomedicine,
optoelectronics
aerospace.
It
is
a
challenge
to
achieve
ultralow
surface
roughness
free
damages.
Due
unique
physicochemical
properties
rare
earths,
ceria
has
garnered
great
progresses
for
atomic
surfaces
induced
by
chemical
mechanical
polishing.
Compared
with
conventional
removal
alumina
silica,
earth
abrasives
selective
material
on
via
their
special
activity,
without
introducing
microscopic
scratches
defects.
Nevertheless,
polishing
performance
depends
series
factors,
e.g.
size
abrasive
particles,
microscale
topological
structure,
configuration
slurry,
auxiliary
energy
etc.
As
result,
it
significant
conduct
comprehensive
review
understand
state-of-the-art
technologies.
This
summarizes
effect
slurries
composed
different
under
conditions.
Additionally,
various
energy-assisted
strategies
are
discussed
using
diverse
kinds
distinct
forms.
Finally,
future
directions
addressed.
ACS Applied Materials & Interfaces,
Год журнала:
2025,
Номер
unknown
Опубликована: Фев. 27, 2025
Patterned
Cu
is
widely
used
for
various
electronic
components,
including
metal
interconnects.
In
the
optoelectronic
industry,
high-resolution
nanopatterning
of
surfaces
commonly
performed
via
photolithography,
which
requires
photoresists
and
harsh
chemicals.
this
study,
we
developed
a
method
fabricating
nanopatterns
based
on
solid-state
electrochemical
etching
at
interface
between
polymer
electrolyte
membrane
(PEM)
Cu.
The
reaction
selectively
ionized
surface
in
contact
with
patterned
PEM
stamp,
allowing
direct
patterning
without
using
resists
or
This
approach
was
successfully
applied
to
produce
patterns
resolutions
less
than
100
nm
hierarchical
structures.
Such
subwavelength
scale
(several
hundred
nanometers)
enable
miniaturization
electrical
circuits
tuning
optical
transmission/reflection
spectra
enhance
device
surfaces.
Semitransparent
electrodes
fabricated
nanopatterned
poly(ethylene
terephthalate)
films
exhibited
good
transmission
resistance
properties.
proposed
stamp-based
technique
avoids
need
liquid
electrolytes
resists,
thereby
offering
simple,
low-cost,
environmentally
friendly
process
