Formation and Oxidation Behavior of Hot-Dip Silicon MoSi2 Self-Healing Thermal Barrier Coating on Mo Substrate at 1500 °C DOI
Yingyi Zhang,

Junjie Zhu,

Tao Fu

и другие.

Journal of Materials Engineering and Performance, Год журнала: 2025, Номер unknown

Опубликована: Апрель 14, 2025

Язык: Английский

Tailoring the hydrogenated mechanism of Pt3Al from first-principles investigation DOI
Yong Pan, Xiaowen Chen, Xiaoyan Zhang

и другие.

Vacuum, Год журнала: 2023, Номер 212, С. 112033 - 112033

Опубликована: Март 22, 2023

Язык: Английский

Процитировано

53

Microstructure and mechanical properties of high strength porous ceramics with high sewage sludge content DOI
Yingyi Zhang,

Laihao Yu,

Jie Wang

и другие.

Journal of Cleaner Production, Год журнала: 2022, Номер 380, С. 135084 - 135084

Опубликована: Ноя. 8, 2022

Язык: Английский

Процитировано

66

Microstructure and oxidation behavior of Si-MoSi2 coating deposited on Mo substrate at 600 °C and 900 °C in static air DOI
Tao Fu, Yingyi Zhang, Fuqiang Shen

и другие.

Materials Characterization, Год журнала: 2022, Номер 192, С. 112192 - 112192

Опубликована: Авг. 4, 2022

Язык: Английский

Процитировано

41

Microstructure and oxidation resistant of Si–NbSi2 coating on Nb substrate at 800°C and 1000°C DOI
Tao Fu,

Luyu Chen,

Yingyi Zhang

и другие.

Ceramics International, Год журнала: 2023, Номер 49(13), С. 21222 - 21233

Опубликована: Март 28, 2023

Язык: Английский

Процитировано

36

Microstructure evolution, growth kinetics and formation mechanisms of silicon-rich NbSi2 coatings on Nb substrate DOI Creative Commons
Yingyi Zhang, Tao Fu,

Junjie Zhu

и другие.

Journal of Materials Research and Technology, Год журнала: 2023, Номер 24, С. 6076 - 6087

Опубликована: Апрель 27, 2023

A Si-rich NbSi2 coating was prepared on Nb substrate by hot dip silicon plating process, which mainly consists of Nb5Si3 interfacial layer, intermediate layer and silicon-rich outer layer. The has flat surface dense structure, the roughness is only 0.218–0.548 μm. Raising deposition temperature can also significantly increase growth rate coating. hot-dip process an extremely low reaction activation energy (249.99 kJ mol−1), indicates that there are a large number activated molecules during plating. atoms in molten bath deposited maintained high chemical potential gradient continuously. Therefore, solid diffusion Nb–Si continuous, phase generated consumed continuously, transformed into phase, led to higher (1.7 × 10−13 4.3 m2 s).

Язык: Английский

Процитировано

34

Boron-based bioactive glasses: Properties, processing, characterization and applications DOI
Awais Ali Aslam,

Javeria Akram,

Rana Adeel Mehmood

и другие.

Ceramics International, Год журнала: 2023, Номер 49(12), С. 19595 - 19605

Опубликована: Март 17, 2023

Язык: Английский

Процитировано

29

Conversion of recycled sludge waste into high value-added ceramics as engineering construction materials: Fabrication, characterization and performance evaluation DOI

Laihao Yu,

Yingyi Zhang, Zhenghao Zhang

и другие.

Chemical Engineering Journal, Год журнала: 2023, Номер 475, С. 146509 - 146509

Опубликована: Окт. 7, 2023

Язык: Английский

Процитировано

25

Exploring the structural, phonon dynamical, mechanical and thermodynamic properties of TM2AlC(TM=Ti, Zr and Hf) carbides DOI
Yong Pan, Zhijing Yang, Hui Zhang

и другие.

Diamond and Related Materials, Год журнала: 2024, Номер 144, С. 110966 - 110966

Опубликована: Март 1, 2024

Язык: Английский

Процитировано

16

Micromorphology evolution, growth mechanism, and oxidation behaviour of the silicon-rich MoSi2 coating at 1200 °C in air DOI Creative Commons
Tao Fu, Yingyi Zhang,

Luyu Chen

и другие.

Journal of Materials Research and Technology, Год журнала: 2024, Номер 29, С. 491 - 503

Опубликована: Янв. 18, 2024

The silicon-rich MoSi2 coating with a submicron surface roughness is deposited on Mo substrate by the hot-dip silicon (HDS) plating process. microstructure, phase composition, and growth mechanism of are characterized. oxidation kinetics coated samples bare at 1200 °C also analyzed compared. results indicate that comprised Si outermost layer, intermediate layer Mo5Si3 interface layer. has high concentration dense structure, average (RSa) only 0.248 μm. After exposed for 20 h, per unit area weight change rate (Mc) 0.183 mg/cm2 thickness oxide 6.72 smooth surface, compact structure excellent self-healing ability ensure its outstanding antioxidant.

Язык: Английский

Процитировано

14

Oxidation resistance of aluminized refractory HfNbTaTiZr high entropy alloy DOI
Ali Günen, Kadir Mert Döleker, Erdoğan Kanca

и другие.

Journal of Alloys and Compounds, Год журнала: 2024, Номер 999, С. 175100 - 175100

Опубликована: Июнь 6, 2024

Язык: Английский

Процитировано

9