Analysis of trace CF4 in SF6 by plasma emission gas chromatography DOI Open Access
Feng Tang, Xinyue Dang, Zishan Zheng

и другие.

Journal of Physics Conference Series, Год журнала: 2025, Номер 2996(1), С. 012024 - 012024

Опубликована: Апрель 1, 2025

Abstract Sulfur hexafluoride (SF 6 ) is widely used as an insulating gas in electrical equipment. The detection of its decomposition products great significance for assessing the operating condition Carbon tetrafluoride (CF 4 a major product SF , and accurate determination content crucial early equipment failures assessment quality. This study explores application plasma emission chromatography analysis trace CF 6. By optimizing chromatographic conditions, efficient sensitive analytical method has been established. experimental results show that when argon carrier gas, limit this low 0.5 ppm, with relative standard deviation (RSD) less than 3%, demonstrating excellent repeatability. Moreover, good linear range (R 2 = 0.998). accuracy reliability have further verified through actual samples. Plasma provides efficient, sensitive, stable new approach it expected to be

Язык: Английский

Analysis of trace CF4 in SF6 by plasma emission gas chromatography DOI Open Access
Feng Tang, Xinyue Dang, Zishan Zheng

и другие.

Journal of Physics Conference Series, Год журнала: 2025, Номер 2996(1), С. 012024 - 012024

Опубликована: Апрель 1, 2025

Abstract Sulfur hexafluoride (SF 6 ) is widely used as an insulating gas in electrical equipment. The detection of its decomposition products great significance for assessing the operating condition Carbon tetrafluoride (CF 4 a major product SF , and accurate determination content crucial early equipment failures assessment quality. This study explores application plasma emission chromatography analysis trace CF 6. By optimizing chromatographic conditions, efficient sensitive analytical method has been established. experimental results show that when argon carrier gas, limit this low 0.5 ppm, with relative standard deviation (RSD) less than 3%, demonstrating excellent repeatability. Moreover, good linear range (R 2 = 0.998). accuracy reliability have further verified through actual samples. Plasma provides efficient, sensitive, stable new approach it expected to be

Язык: Английский

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