Materials, Год журнала: 2025, Номер 18(8), С. 1729 - 1729
Опубликована: Апрель 10, 2025
Inorganic multilayer films for radiative cooling have garnered significant attention due to their exceptional resistance photothermal degradation. However, the design and fabrication of structurally simple cost-effective inorganic remain challenging limitations in material properties preparation process. This study develops a film (Si3N4/SiO2/Al2O3/Si3N4/Al) daytime cooling. Instead conventional periodic alternation high low refractive indices (H-L…H-L), this work proposes H-L-L-H symmetric structure achieve improved performance. The fabricated demonstrates superior lower thickness than that current studies using Al as reflective layer, achieving solar reflectance 89.57%, an atmospheric window (8–13 μm) emissivity 83.41%, net power 63.38 W·m−2. Under direct sunlight, demonstrated maximum temperature reduction approximately 3 °C compared reference sample. By employing thermal treatment process Si3N4 poor adhesion between layer is successfully addressed without compromising optical underlying physical mechanisms are also elucidated. provides effective strategy developing suitable large-scale industrial production.
Язык: Английский