ACS Applied Materials & Interfaces, Год журнала: 2025, Номер unknown
Опубликована: Апрель 22, 2025
Leveler is the key additive for achieving microvia void-free filling in high-density integration of electronic components miniaturization, lightweighting, and intelligent development devices. Traditional organic levelers are mostly quaternary ammonium salts nitrogen-containing heterocyclic compounds. In this study, thiosemicarbazide (TA) 1-phenyl 2-thiourea (PTA), which thioamino compounds with different substituents amino phenyl, used first time as an acidic copper sulfate bath Cu electroplating (Cu-EP). The results demonstrate that only PTA, when leveler combination poly(ethylene glycol) (PEG) suppressor bis(sodium sulfopropyl)-disulfide (SPS) accelerator, can achieve filling. Chronopotentiometric analyses reveal both TA PTA accelerate reduction cupric ions. accelerator SPS synergistically enhances accelerating effect, while it behaves competitive adsorption to weaken effect. PEG cooperate show a strong inhibiting effect on ion but presents TA, weakening PEG. Under such complex interactions these additives, has been found SPS, exhibits convection-dependent behavior, more negative potential ions at mouth than bottom microvia, indicating theoretical feasibility Cyclic voltammetry experiments further ions, acceleration weakened by due adsorption. synergizes greatly enhance reduction. According electrochemical properties essence PTA-based elucidated through simulations. When three additives coexist, coverage PTA-PEG gradually decreases from bottom. As synergistic inhibition gradient significantly inhibits deposition mouth; simultaneously, increases bottom, facilitating dual effects enable
Язык: Английский