A review on the development of ceria for chemical mechanical polishing

Powder Technology, Год журнала: 2024, Номер 444, С. 119989 - 119989

Опубликована: Июнь 12, 2024

Язык: Английский

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Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives

Tribology International, Год журнала: 2024, Номер 197, С. 109827 - 109827

Опубликована: Май 26, 2024

Язык: Английский

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Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism

Applied Surface Science, Год журнала: 2024, Номер 679, С. 161157 - 161157

Опубликована: Сен. 3, 2024

Язык: Английский

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Review on chemical mechanical polishing for atomic surfaces using advanced rare earth abrasives

Journal of Physics D Applied Physics, Год журнала: 2024, Номер 58(2), С. 023004 - 023004

Опубликована: Окт. 8, 2024

Abstract During the past decades, high-performance devices and setups have been widely used in fields of precision optics, semiconductors, microelectronics, biomedicine, optoelectronics aerospace. It is a challenge to achieve ultralow surface roughness free damages. Due unique physicochemical properties rare earths, ceria has garnered great progresses for atomic surfaces induced by chemical mechanical polishing. Compared with conventional removal alumina silica, earth abrasives selective material on via their special activity, without introducing microscopic scratches defects. Nevertheless, polishing performance depends series factors, e.g. size abrasive particles, microscale topological structure, configuration slurry, auxiliary energy etc. As result, it significant conduct comprehensive review understand state-of-the-art technologies. This summarizes effect slurries composed different under conditions. Additionally, various energy-assisted strategies are discussed using diverse kinds distinct forms. Finally, future directions addressed.

Язык: Английский

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Atomic surface of fused silica with high material removal rate produced by novel chemical mechanical polishing using composite rare earth oxides

Colloids and Surfaces A Physicochemical and Engineering Aspects, Год журнала: 2025, Номер unknown, С. 136420 - 136420

Опубликована: Фев. 1, 2025

Язык: Английский

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Enhanced chemical mechanical polishing (CMP) performance of porous self-assembled spherical cerium oxide via RE(La/Pr/Nd) doping

Applied Surface Science, Год журнала: 2024, Номер unknown, С. 161236 - 161236

Опубликована: Сен. 1, 2024

Язык: Английский

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Scratching properties of 4H–SiC single crystal after oxidation under different conditions

Wear, Год журнала: 2024, Номер 556-557, С. 205503 - 205503

Опубликована: Июль 23, 2024

Язык: Английский

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Angle-resolved ellipsometric analysis of polishing-induced subsurface damages in calcium fluoride crystals for ultra-precision manufacturing

Applied Surface Science, Год журнала: 2025, Номер unknown, С. 162997 - 162997

Опубликована: Март 1, 2025

Язык: Английский

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Development and characterization of a novel alginate-based slurry and its fused silica CMP investigations

Ceramics International, Год журнала: 2025, Номер unknown

Опубликована: Март 1, 2025

Язык: Английский

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Experimental study and DFT+U calculations on the impact of Rare-Earth ion (La3+, Sm3+, Y3+, Yb3+) doped CeO2 Core-Shell abrasives on polishing performance

Applied Surface Science, Год журнала: 2024, Номер 676, С. 161028 - 161028

Опубликована: Авг. 22, 2024

Язык: Английский

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