CO2-Sourced Poly(chloropropylene carbonate) with High Flame-Retardant Performance DOI
Yue Gong, Xiaofeng Zhu, Guan‐Wen Yang

et al.

Chinese Journal of Polymer Science, Journal Year: 2024, Volume and Issue: unknown

Published: Dec. 25, 2024

Language: Английский

Evolution of Copolymers of Epoxides and CO2: Catalysts, Monomers, Architectures, and Applications DOI
Guan‐Wen Yang, Rui Xie, Yao‐Yao Zhang

et al.

Chemical Reviews, Journal Year: 2024, Volume and Issue: unknown

Published: Oct. 25, 2024

The copolymerization of CO

Language: Английский

Citations

11
Nanofabrication of nanostructure lattices: from high-quality large patterns to precise hybrid units DOI Creative Commons
Rui Ma, Xiaodan Zhang, Duncan S. Sutherland

et al.

International Journal of Extreme Manufacturing, Journal Year: 2024, Volume and Issue: 6(6), P. 062004 - 062004

Published: July 27, 2024

Abstract Sub-wavelength nanostructure lattices provide versatile platforms for light control and the basis various novel phenomena applications in physics, material science, chemistry, biology, energy. The thriving study of is building on remarkable progress nanofabrication techniques, especially possibility fabricating larger-area patterns while achieving higher-quality lattices, complex shapes, hybrid materials units. In this review, we present a comprehensive review techniques large-area fabrication optical arrays, encompassing direct writing, self-assembly, controllable deposition, nanoimprint/print methods. Furthermore, particular focus made recent improvement unit accuracy diversity, leading to integrated multifunctional structures devices applications.

Language: Английский

Citations

7
Development of a Deep Ultraviolet Positive-Tone Photoresist from the Sustainable Building Block Cyrene DOI
Yizhou Liu, Josua Markus, Han‐Hao Cheng

et al.

Chemistry of Materials, Journal Year: 2025, Volume and Issue: unknown

Published: Jan. 28, 2025

Language: Английский

Citations

0
Enhancing Performance of Cross-Linking Negative-Tone Chemically Amplified Photoresists by Controlling Interfacial Interactions via Molecular Hydrophilicity Adjustment DOI

Siliang Zhang,

Xuewen Cui,

Cong Xue

et al.

Chemistry of Materials, Journal Year: 2025, Volume and Issue: unknown

Published: Feb. 27, 2025

Language: Английский

Citations

0
Extended model for chemically amplified resist with multiple photoacid generators DOI
Di Yao,

Lisong Dong,

Yunyun Hao

et al.

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, Journal Year: 2025, Volume and Issue: 43(2)

Published: March 1, 2025

The chemically amplified resist, which contains photoacid generator (PAG), has been widely used in high-volume integrated circuit manufacturing. Conventional resist models represent postexposure bake (PEB) as a diffusion-reaction system involving the diffusion, neutralization, and amplification of unitary acid quencher. However, when resists with multiple PAGs are introduced for advanced process, existing fail to capture complex chemical interactions PAGs. In this study, we propose an extended model that accounts formulation improve accuracy model. Our distinguishes acid-producing capacity considers effects different amplification, neutralization rates on protection group concentration among acids. Thus, can more accurately dynamics response during exposure PEB processes. exemplary simulations demonstrate our offer superior simulation compared conventional physical By calibrating nearly 20 parameters proposed model, it achieves 59% 26% reductions root mean square error critical dimensions test patterns. Those results confirm prediction multi-PAG offering valuable tool simulating optimizing lithography formulation.

Language: Английский

Citations

0
CO2-Sourced Poly(chloropropylene carbonate) with High Flame-Retardant Performance DOI
Yue Gong, Xiaofeng Zhu, Guan‐Wen Yang

et al.

Chinese Journal of Polymer Science, Journal Year: 2024, Volume and Issue: unknown

Published: Dec. 25, 2024

Language: Английский

Citations

0