Journal of the American Ceramic Society,
Journal Year:
2024,
Volume and Issue:
unknown
Published: Oct. 15, 2024
Abstract
This
study
deals
with
the
effect
of
Cu
on
hydroxyapatite
(HAp)
thin
films
silicon
substrates
prepared
by
pulsed
laser
deposition
(PLD)
technique
for
concentrations
ranging
from
0
to
0.8
wt.%.
Fourier
transform
infrared
spectroscopy
and
Raman
provide
additional
evidence
HAp
in
films,
which
exhibit
characteristic
bands
such
as
960
cm
−1
phosphate
ion
band.
The
X‐ray
diffraction
patterns
confirm
presence
HAp,
without
copper‐related
peaks,
suggesting
that
it
is
not
incorporated
into
lattice,
present
an
amorphous
phase.
photoelectron
confirms
possibly
related
adsorption
2+
surfaces
through
electrostatic
or
interactions
(PO
4
)
3−
groups.
Atomic
force
microscopy
shows
roughness
varies
depending
absence
copper
ions.
Finally,
density
functional
theory
kinetic
Monte
Carlo
simulations
explain
effects
atomic
diffusion
clustering.
These
changes
correlate
contact
angle
values,
indicating
formation
hydrophobic
due
inclusions.
