Materials, Journal Year: 2025, Volume and Issue: 18(2), P. 381 - 381
Published: Jan. 15, 2025
(Meth)acrylate polymers are commonly used as photoresist materials in photolithography. However, these encounter the problem of swelling during development process. To address this, we explored use a hydrophobic group to control solubility hydrophilic developer. In this study, synthesized two types evaluate impact developer on (meth)acrylate for applications. Adamantyl methacrylate (AdMA) was selected group, while 2-ethoxyethyl acrylate (2-EEA) served enabling synthesis both and polymers. Our goal assess how presence adamantyl monomers influenced polymer. This study demonstrated that primarily by functional groups, particularly rather than other factors. Polymers with more 50% groups can be effectively controlled their TMAH. These findings show TMAH tuned incorporating high proportion groups. The further confirms role effective (aliphatic) modulating solutions.
Language: Английский