Micromachines,
Journal Year:
2025,
Volume and Issue:
16(5), P. 540 - 540
Published: April 30, 2025
Nanoplasmonic
structures
have
emerged
as
a
promising
approach
to
address
light
trapping
limitations
in
thin-film
optoelectronic
devices.
This
study
investigates
the
integration
of
metallic
nanoparticle
arrays
onto
nanocrystalline
silicon
(nc-Si:H)
thin
films
enhance
optical
absorption
through
plasmonic
effects.
Using
finite-difference
time-domain
(FDTD)
simulations,
we
systematically
optimize
key
design
parameters,
including
geometry,
spacing,
metal
type
(Ag
and
Al),
dielectric
spacer
material,
absorber
layer
thickness.
The
results
show
that
localized
surface
plasmon
resonances
(LSPRs)
significantly
amplify
near-field
intensities,
improve
forward
scattering,
facilitate
coupling
into
waveguide
modes
within
active
layer.
These
effects
lead
measurable
increase
integrated
quantum
efficiency,
with
improvements
reaching
up
30%
compared
bare
nc-Si:H
films.
findings
establish
reliable
framework
for
engineering
nanoplasmonic
architectures
can
be
applied
performance
photovoltaic
devices,
photodetectors,
other
systems.
Chips,
Journal Year:
2025,
Volume and Issue:
4(1), P. 10 - 10
Published: March 10, 2025
This
article
summarizes
the
current
development
status
of
nanoimprint
lithography
(NIL)
technology
and
its
application
prospects
in
multiple
industries.
Nanoimprint
has
significant
advantages,
such
as
low
cost,
high
resolution,
no
development,
is
not
affected
by
standing
wave
effects,
making
it
a
potential
industries
semiconductors,
photovoltaics,
LEDs.
However,
still
faces
challenges
terms
film
characteristics
material
selection
during
application.
analyzes
existing
research
discusses
advantages
fields
patterned
sapphire
substrates
(PSSs),
Light-Emitting
Diode
(LED)
chips,
photovoltaic
cells,
etc.,
proposes
role
technological
progress
promoting
industrialization.
opportunities
future
industrialization
process
anticipates
for
large-scale
production.
Micromachines,
Journal Year:
2025,
Volume and Issue:
16(5), P. 540 - 540
Published: April 30, 2025
Nanoplasmonic
structures
have
emerged
as
a
promising
approach
to
address
light
trapping
limitations
in
thin-film
optoelectronic
devices.
This
study
investigates
the
integration
of
metallic
nanoparticle
arrays
onto
nanocrystalline
silicon
(nc-Si:H)
thin
films
enhance
optical
absorption
through
plasmonic
effects.
Using
finite-difference
time-domain
(FDTD)
simulations,
we
systematically
optimize
key
design
parameters,
including
geometry,
spacing,
metal
type
(Ag
and
Al),
dielectric
spacer
material,
absorber
layer
thickness.
The
results
show
that
localized
surface
plasmon
resonances
(LSPRs)
significantly
amplify
near-field
intensities,
improve
forward
scattering,
facilitate
coupling
into
waveguide
modes
within
active
layer.
These
effects
lead
measurable
increase
integrated
quantum
efficiency,
with
improvements
reaching
up
30%
compared
bare
nc-Si:H
films.
findings
establish
reliable
framework
for
engineering
nanoplasmonic
architectures
can
be
applied
performance
photovoltaic
devices,
photodetectors,
other
systems.
