Advanced Materials Interfaces,
Journal Year:
2025,
Volume and Issue:
unknown
Published: March 11, 2025
Abstract
This
study
scales
up
the
chemical
vapor
deposition
(CVD)
process
for
graphene
growth
using
CH₄
and
H₂
mixtures
on
large
molten
Cu
substrates
a
liquid
metal
catalyst
(LMCat)
reactor.
In
situ
optical
microscopy
ex
Raman
spectroscopy
reveal
key
differences
from
previous
studies
smaller
surfaces.
Graphene
grown
exhibits
improved
quality
uniformity
at
low
[CH₄]/[H₂]
ratios.
A
shift
in
mechanism
is
observed:
[CH₄]/[H₂],
single‐front
yields
high‐quality
graphene,
whereas
higher
ratios
cause
multiple
nuclei
to
merge,
forming
nucleation‐flow‐merger
pattern.
confirms
uniform
[CH₄]/[H₂].
At
intermediate
few‐layer
grows
uniformly
larger
substrates.
Finite
element
analysis
COMSOL
Multiphysics
shows
that
efficient
heating
of
reaction
gases
by
enhances
growth.
An
empirical
model,
developed
experimental
data,
reliably
predicts
fastest
These
findings
address
critical
challenges
advance
feasibility
continuous,
industrial‐scale
production
catalysts.
