Nano Letters,
Journal Year:
2025,
Volume and Issue:
unknown
Published: April 30, 2025
The
advancement
of
integrated
circuit
manufacturing
has
continuously
relied
on
lithography
technology
as
a
fundamental
driving
force.
However,
the
development
photoresists
faces
resolution-line
edge
roughness-sensitivity
(RLS)
trade-off,
hindering
simultaneous
optimization.
To
address
this
issue,
we
propose
collaborative
strategy
for
heterogeneous
isomorphism
cluster
with
different
radiation
responses.
Ti4M4-oxo
platform
[Ti4Zr4O6(OBu)4(OMc)16]
(T4Z4),
higher
sensitivity,
was
applied
photosensitizer
resolution
photoresist
[Ti4Hf4O6(OBu)4(OMc)16]
(T4H4),
allowing
hybrid
to
effectively
induce
cross-linking
at
low
exposure
doses,
synergistically
producing
high-resolution
patterns.
This
achieved
an
e-beam
enhancement
from
16
7.5
nm,
successful
fabrication
intricate
patterns
under
10
nm.
also
exhibits
capability
etch
transfer
below
20
nm
onto
silicon
dioxide
substrates,
highlighting
its
potential
future
device
manufacturing.
work
presents
new
perspective
design
tackle
RLS
trade-off
limitations.
Journal of Materials Chemistry A,
Journal Year:
2023,
Volume and Issue:
11(34), P. 18236 - 18246
Published: Jan. 1, 2023
By
utilizing
an
organic
linker
containing
two
photoactive
groups,
Zr-MOF
with
multiple
photofunctionalities,
such
as
photochromism,
photo-induced
structural
transformation,
and
photo-catalysis,
has
been
explored.
Science Advances,
Journal Year:
2023,
Volume and Issue:
9(33)
Published: Aug. 16, 2023
We
present
a
universal
direct
photocatalytic
patterning
method
that
can
completely
preserve
the
optical
properties
of
perovskite
nanocrystals
(PeNCs)
and
other
emissive
nanomaterials.
Solubility
change
PeNCs
is
achieved
mainly
by
photoinduced
thiol-ene
click
reaction
between
specially
tailored
surface
ligands
dual-role
reagent,
pentaerythritol
tetrakis(3-mercaptopropionate)
(PTMP),
where
enabled
at
low
light
intensity
dose
(~
30
millijoules
per
square
centimeter)
strong
activity
PeNCs.
The
photochemical
mechanism
was
investigated
using
various
analyses
each
step.
PTMP
also
acts
as
defect
passivation
agent
for
even
enhances
their
photoluminescence
quantum
yield
(by
~5%)
photostability.
Multicolor
patterns
cesium
lead
halide
(CsPbX3)PeNCs
were
fabricated
with
high
resolution
(<1
micrometer).
Our
widely
applicable
to
classes
nanomaterials
including
colloidal
cadmium
selenide-based
indium
phosphide-based
dots
light-emitting
polymers;
this
generality
provides
nondestructive
simple
way
pattern
functional
materials
devices.
Chemical Science,
Journal Year:
2025,
Volume and Issue:
unknown
Published: Jan. 1, 2025
Traditional
photosensitive
polyimide
(PSPI)
materials
require
a
high
curing
temperature
and
exhibit
low
transparency,
limiting
their
applications
in
thermally
sensitive
optical
devices.
To
overcome
this
challenge,
soluble
resins
were
synthesized
based
on
the
structural
design
of
bio-based
magnolol
monomer.
It
is
noteworthy
that
PI
photoresist,
developed
by
using
as-prepared
polyimides
non-toxic
solvents
(2-acetoxy-1-methoxypropane,
PGEMA)
other
additives,
demonstrated
an
impressive
low-temperature
performance
(180
°C).
Furthermore,
solvent
residue
cured
film
prepared
PGEMA
as
was
markedly
decreased
compared
to
N-methyl
pyrrolidone
(NMP).
In
addition,
C-PI-3
films
photoinitiated
thiol-ene
radical
reactions
exhibited
transparency
with
average
visible
light
transmittance
87.8%,
well
excellent
thermal
stability,
dielectric
breakdown
properties,
photo-patterning
capabilities.
This
partially
innocuous
solvent-based
PSPI
curability
properties
could
be
pioneering
example
resolve
challenges
energy
efficiency
environmental
sustainability
expected
used
field
color
filters.
Nano Letters,
Journal Year:
2025,
Volume and Issue:
unknown
Published: Jan. 26, 2025
Rare-earth
(RE)
metals
are
known
as
industrial
vitamins
and
show
significant
regulatory
effects
in
many
fields.
In
this
work,
we
first
demonstrated
that
the
vitamin
effect
of
RE
can
also
be
applied
to
extreme
ultraviolet
(EUV)
lithography.
Using
a
Sn8RE
oxo
cluster
universal
platform,
different
individual
metal
ions
were
successfully
doped
obtain
series
isomorphic
heterometallic
clusters
(RE
=
Y,
Sm,
Eu,
Ho,
Er).
Lithography
experiments
have
shown
displayed
influence
on
technical
parameters.
As
result,
an
electron-beam
lithography
(EBL)
line
width
11.95
nm
was
achieved
by
Sn8Er,
EUV
critical
dimension
(CD)
15.90
obtained
Sn8Ho
under
exposure
dose
52.64
mJ/cm2.
These
findings
expand
applications
rare
earths
high-precision
semiconductor
manufacturing
provide
new
strategy
for
development
high-resolution
photoresists.
ACS Applied Nano Materials,
Journal Year:
2023,
Volume and Issue:
6(19), P. 18480 - 18490
Published: Sept. 19, 2023
In
this
study,
a
series
of
molecular
resists
based
on
bis(4-butoxyphenyl)
sulfone
core
attached
to
varying
number
radiation-sensitive
triphenylsulfonium
units
(BPSSn,
where
n
=
2,
3,
and
4)
were
designed
synthesized.
We
evaluated
the
physical
properties
these
resists,
including
solubility,
film-forming
ability,
thermal
stability,
assess
their
viability
as
photoresist
materials.
The
materials
allowed
for
negative
patterning
through
organic
development
in
both
e-beam
extreme
ultraviolet
(EUV)
lithography.
Through
manipulating
average
molecule
optimizing
developing
agents,
BPSS4
demonstrated
high
resolution
(16/13
nm)
low
line
edge
roughness
(2.5/2.5
EUV
dense
patterning,
respectively.
further
explored
exposure
mechanisms
resist
using
X-ray
photoelectron
spectroscopy.
also
investigated
outgassing
behavior
film
during
irradiation
via
situ
mass
Remarkably,
nonchemically
amplified
exhibited
etch
resistance
accurate
pattern
transfer
capabilities.
durability
(under
SF6/O2
plasma
chemistry)
with
respect
Si
wafer
was
21:1,
highlighting
its
significant
potential
practical
applications
high-resolution
Applied Research,
Journal Year:
2023,
Volume and Issue:
2(6)
Published: Sept. 1, 2023
Abstract
Photopolymerization
is
an
energy‐saving
and
environmentally
friendly
technology
has
been
widely
applied
continuously
developed
in
various
fields
since
the
mid‐20th
century.
Today,
photopolymerization
become
ubiquitous
every
aspect
of
our
lives.
This
review
initially
explains
principle
reactions,
introducing
process
initiation
mechanisms
photoinitiators.
Then,
this
focuses
on
applications
thiol‐based
click
photoinduced
controlled/living
polymerizations,
three‐dimensional
printing,
ultraviolet
nanoimprint
lithography
photoresist
hydrogels
to
demonstrate
its
irreplaceable
role
at
present.
