Selective H/D Exchange in E–H (E = Si, Ge, Sn) Bonds Catalyzed by 1,2,3-Triazolylidene-Stabilized Nickel Nanoparticles DOI

Pablo Molinillo,

Al Postigo, Maxime Puyo

et al.

Inorganic Chemistry, Journal Year: 2025, Volume and Issue: unknown

Published: April 16, 2025

Nickel nanoparticles (Ni·MIC) stabilized with mesoionic 1,2,3-triazolylidene (MIC) ligands were prepared via decomposition of the [Ni(COD)2] (COD = 1,5-cyclooctadiene) complex H2 (3 bar) in presence 0.2 or 0.5 equiv ligand. The obtained monodisperse and small-sized (3.2-3.8 nm) characterized by high-resolution transmission electron microscopy (TEM, HRTEM) inductively coupled plasma (ICP) analysis. Further analysis nickel X-ray photoelectron spectroscopy (XPS) demonstrated coordination MIC to metal surface. Finally, Ni·MIC applied isotopic H/D exchange hydrides group 14 elements (Si, Ge, Sn) using D2 gas under relatively mild conditions (1.0-1.8 mol % Ni, 1 bar D2, 55 °C). High chemoselective deuterium incorporation at E-H (E Si, bond these derivatives was observed.

Language: Английский

Selective H/D Exchange in E–H (E = Si, Ge, Sn) Bonds Catalyzed by 1,2,3-Triazolylidene-Stabilized Nickel Nanoparticles DOI

Pablo Molinillo,

Al Postigo, Maxime Puyo

et al.

Inorganic Chemistry, Journal Year: 2025, Volume and Issue: unknown

Published: April 16, 2025

Nickel nanoparticles (Ni·MIC) stabilized with mesoionic 1,2,3-triazolylidene (MIC) ligands were prepared via decomposition of the [Ni(COD)2] (COD = 1,5-cyclooctadiene) complex H2 (3 bar) in presence 0.2 or 0.5 equiv ligand. The obtained monodisperse and small-sized (3.2-3.8 nm) characterized by high-resolution transmission electron microscopy (TEM, HRTEM) inductively coupled plasma (ICP) analysis. Further analysis nickel X-ray photoelectron spectroscopy (XPS) demonstrated coordination MIC to metal surface. Finally, Ni·MIC applied isotopic H/D exchange hydrides group 14 elements (Si, Ge, Sn) using D2 gas under relatively mild conditions (1.0-1.8 mol % Ni, 1 bar D2, 55 °C). High chemoselective deuterium incorporation at E-H (E Si, bond these derivatives was observed.

Language: Английский

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