Near-Infrared Light-Induced Deep Curing of Thiol–Epoxy Networks Based on Upconversion Photochemistry DOI Open Access

Pin Yang,

Yaoxin Huang,

Xiaoxuan Liu

et al.

Coatings, Journal Year: 2025, Volume and Issue: 15(4), P. 494 - 494

Published: April 21, 2025

Thiol–epoxy photopolymerization offers exceptional advantages for high-performance protective coatings, yet efficiently curing thick formulations remains a significant challenge due to the limited penetration depth of conventional UV light. Herein, we report novel near-infrared (NIR) light-activated system deep-curing applications, strategically integrating upconversion nanoparticles (UCNPs) as NIR-to-UV converters, isopropylthioxanthone (ITX) photosensitizer, and liquid N-phenylglycine-based photobase generator (NPG-TBD) with enhanced resin solubility. Upon 980 nm NIR irradiation, photogenerated TBD catalyzes thiol–epoxy polymerization through an anionic mechanism, enabling uniform network formation epoxy thiol functional group conversions greater than 90% throughout samples exceeding 2.5 cm in thickness. The resulting coatings exhibit excellent mechanical properties including 3H pencil hardness, strong adhesion (0 grade), good flexibility (2 mm), significantly outperforming systems approximately 1.5 mm. Additionally, cured materials demonstrate multifunctional characteristics distinctive luminescence dual-responsive shape memory behavior. This approach addresses critical limitations deep-photocuring technology while offering potential applications marine infrastructure, chemical storage facilities, smart requiring both substantial barrier programmable responsiveness.

Language: Английский

Near-Infrared Light-Induced Deep Curing of Thiol–Epoxy Networks Based on Upconversion Photochemistry DOI Open Access

Pin Yang,

Yaoxin Huang,

Xiaoxuan Liu

et al.

Coatings, Journal Year: 2025, Volume and Issue: 15(4), P. 494 - 494

Published: April 21, 2025

Thiol–epoxy photopolymerization offers exceptional advantages for high-performance protective coatings, yet efficiently curing thick formulations remains a significant challenge due to the limited penetration depth of conventional UV light. Herein, we report novel near-infrared (NIR) light-activated system deep-curing applications, strategically integrating upconversion nanoparticles (UCNPs) as NIR-to-UV converters, isopropylthioxanthone (ITX) photosensitizer, and liquid N-phenylglycine-based photobase generator (NPG-TBD) with enhanced resin solubility. Upon 980 nm NIR irradiation, photogenerated TBD catalyzes thiol–epoxy polymerization through an anionic mechanism, enabling uniform network formation epoxy thiol functional group conversions greater than 90% throughout samples exceeding 2.5 cm in thickness. The resulting coatings exhibit excellent mechanical properties including 3H pencil hardness, strong adhesion (0 grade), good flexibility (2 mm), significantly outperforming systems approximately 1.5 mm. Additionally, cured materials demonstrate multifunctional characteristics distinctive luminescence dual-responsive shape memory behavior. This approach addresses critical limitations deep-photocuring technology while offering potential applications marine infrastructure, chemical storage facilities, smart requiring both substantial barrier programmable responsiveness.

Language: Английский

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