arXiv (Cornell University),
Journal Year:
2023,
Volume and Issue:
unknown
Published: Jan. 1, 2023
We
demonstrate
aluminum-on-silicon
planar
transmon
qubits
with
time-averaged
${T_1}$
energy
relaxation
times
of
up
to
${270\,\mu
s}$,
corresponding
Q
=
5
million,
and
a
highest
observed
value
${501\,\mu
s}$.
use
materials
analysis
techniques
numerical
simulations
investigate
the
dominant
sources
loss,
devise
strategy
towards
mitigating
them.
The
mitigation
loss
is
achieved
by
reducing
presence
oxide,
known
host
defects,
near
substrate-metal
interface,
growing
aluminum
films
thicker
than
300
nm.
A
coplanar-waveguide
resonators
shows
that
improvement
owing
reduction
dielectric
due
two-level
system
defects.
perform
time-of-flight
secondary
ion
mass
spectrometry
observe
reduced
oxygen
at
interface
for
films.
correlation
between
enhanced
performance
film
thickness
tendency
grow
in
columnar
structures
parallel
grain
boundaries,
where
size
depends
on
thickness:
transmission
electron
microscopy
imaging
has
larger
grains
consequently
fewer
boundaries
containing
oxide
this
interface.
These
conclusions
are
supported
different
contributions
device.
Universal
quantum
gates
are
crucial
for
efficient
algorithm
execution
on
computers,
offering
rapid
and
fault-tolerant
manipulations.
This
paper
presents
a
theoretical
framework
realizing
novel
entangling
universal
gate
within
the
circuit
electrodynamics
(circuit
QED)
architecture.
Our
approach
involves
positioning
two
SQUIDs
qubits
resonant
single-mode
microwave
cavity
field,
enabling
implementation
of
SQSCZ
gate,
fusion
square
root
SWAP
($\sqrt{SWAP}$)
controlled-Z
($\sqrt{CZ}$)
gates.
serves
as
fundamental
building
block
constructing
including
controlled-NOT
Moreover,
operates
unitarily,
ensuring
logical
reversibility,
exhibits
an
power
(EP)
1.5/9.
Quantitative
analysis
reveals
average
fidelity
$60\%$.
To
delve
deeper
into
gate's
performance,
we
conducted
process
tomography
(QPT)
by
repeating
experiment
11,000
times
each
measurement
basis
IBM
Quantum's
simulator.
rigorous
yielded
remarkable
$96.065616\%$.
These
findings
offer
promising
implications
future
research
applications.
npj Quantum Information,
Journal Year:
2024,
Volume and Issue:
10(1)
Published: Aug. 14, 2024
Abstract
We
demonstrate
aluminum-on-silicon
planar
transmon
qubits
with
time-averaged
T
1
energy
relaxation
times
of
up
to
270
μs,
corresponding
Q
=
5
million,
and
a
highest
observed
value
501
μs.
Through
materials
analysis
techniques
numerical
simulations
we
investigate
the
dominant
source
loss,
devise
strategy
toward
its
mitigation.
Growing
aluminum
films
thicker
than
300
nm
reduces
presence
oxide,
known
host
defects,
near
substrate-metal
interface,
as
confirmed
by
time-of-flight
secondary
ion
mass
spectrometry.
A
loss
coplanar
waveguide
resonators
shows
that
this
results
in
reduction
dielectric
due
two-level
system
defects.
The
correlation
between
enhanced
performance
our
devices
film
thickness
is
growth
columnar
structures
parallel
grain
boundaries:
transmission
electron
microscopy
larger
grains
film,
consequently
fewer
boundaries
containing
oxide
interface.
PRX Quantum,
Journal Year:
2024,
Volume and Issue:
5(3)
Published: Sept. 12, 2024
Quantum
processors
require
a
signal-delivery
architecture
with
high
addressability
(low
crosstalk)
to
ensure
performance
already
at
the
scale
of
dozens
qubits.
Signal
crosstalk
causes
inadvertent
driving
quantum
gates,
which
will
adversely
affect
gate
fidelities
in
scaled-up
devices.
Here,
we
demonstrate
packaged
flip-chip
superconducting
signal-crosstalk
competitive
those
reported
other
platforms.
For
capacitively
coupled
qubit-drive
lines,
find
on-resonant
better
than
−27
dB
(average
−37
dB).
inductively
magnetic-flux-drive
less
0.13%
direct-current
flux
0.05%).
These
observed
levels
are
adequately
small
and
indicate
decreasing
trend
increasing
distance,
is
promising
for
further
scaling
up
larger
numbers
We
discuss
implications
our
results
design
low-crosstalk
on-chip
architecture,
including
influence
shielding
tunnel
structure,
potential
sources
crosstalk,
estimation
crosstalk-induced
qubit-gate
error
processors.
Published
by
American
Physical
Society
2024
npj Quantum Information,
Journal Year:
2024,
Volume and Issue:
10(1)
Published: July 2, 2024
Abstract
While
quantum
circuits
are
reaching
impressive
widths
in
the
hundreds
of
qubits,
their
depths
have
not
been
able
to
keep
pace.
In
particular,
cloud
computing
gates
on
multi-qubit,
fixed-frequency
superconducting
chips
continue
hover
around
1%
error
range,
contrasting
with
progress
seen
carefully
designed
two-qubit
chips,
where
rates
pushed
towards
0.1%.
Despite
strong
impetus
and
a
plethora
research,
experimental
demonstration
suppression
these
multi-qubit
devices
remains
challenging,
primarily
due
wide
distribution
qubit
parameters
demanding
calibration
process
required
for
advanced
control
methods.
Here,
we
achieve
this
goal,
using
simple
method
based
multi-derivative,
multi-constraint
pulse
shaping,
which
acts
simultaneously
against
multiple
sources.
Our
approach
establishes
two
fourfold
improvement
default
scheme,
demonstrated
four
qubits
IBM
Quantum
Platform
limited
intermittent
access,
enabling
large-scale
systems
fully
take
advantage
superior
coherence
times.
The
achieved
CNOT
fidelities
99.7(1)%
those
publically
available
come
from
both
coherent
accelerated
gate
time.
Advanced Materials,
Journal Year:
2025,
Volume and Issue:
unknown
Published: Jan. 19, 2025
Abstract
A
sapphire
machining
process
integrated
with
intermediate‐scale
quantum
processors
is
demonstrated.
The
allows
through‐substrate
electrical
connections,
necessary
for
low‐frequency
mode‐mitigation,
as
well
signal‐routing,
which
are
vital
computers
scale
in
qubit
number,
and
thus
dimension.
High‐coherence
qubits
required
to
build
fault‐tolerant
so
material
choices
an
important
consideration
when
developing
a
technology
platform.
Sapphire,
low‐loss
dielectric
substrate,
has
shown
support
high‐coherence
qubits.
In
addition,
recent
advances
such
tantalum
titanium‐nitride,
both
deposited
on
have
demonstrated
lifetimes
exceeding
0.3
ms.
However,
the
lack
of
any
equivalent
deep‐silicon
etching
create
through‐substrate‐vias
sapphire,
or
inductively
shunt
large
dies,
limited
small‐scale
processors,
necessitates
use
chiplet
architecture.
Here,
that
compatible
presented.
This
technique
immediately
provides
means
processing
units
(QPUs)
route
toward
development
through‐sapphire‐vias,
allow
advantages
be
leveraged
facilitating
sapphire‐compatible
materials
large‐scale
QPUs.
Nature Communications,
Journal Year:
2025,
Volume and Issue:
16(1)
Published: April 16, 2025
Abstract
Superconducting
microwave
metamaterials
offer
enormous
potential
for
quantum
optics
and
information
science,
enabling
the
development
of
advanced
technologies
sensing
amplification.
In
context
circuit
electrodynamics,
such
can
be
implemented
as
coupled
cavity
arrays
(CCAs).
continuous
effort
to
miniaturize
devices
increasing
scalability,
minimizing
footprint
CCAs
while
preserving
low
disorder
becomes
paramount.
this
work,
we
present
a
compact
CCA
architecture
using
superconducting
NbN
thin
films
manifesting
high
kinetic
inductance.
The
latter
enables
high-impedance
(~1.5
kΩ),
reducing
resonator
footprint.
We
demonstrate
its
versatility
scalability
by
engineering
one-dimensional
with
up
100
resonators
structures
that
exhibit
multiple
bandgaps.
Additionally,
quantitatively
investigate
in
symmetry-protected
topological
SSH
edge
modes,
from
which
extract
frequency
scattering
$$0.2{2}_{-0.03}^{+0.04}\%$$
0.22−0.03+0.04%
.
Our
platform
opens
exciting
prospects
analog
simulations
many-body
physics
ultrastrongly
emitters.
Quantum Science and Technology,
Journal Year:
2023,
Volume and Issue:
9(2), P. 025006 - 025006
Published: Dec. 29, 2023
Abstract
We
investigate
die-level
and
wafer-scale
uniformity
of
Dolan-bridge
bridgeless
Manhattan-style
Josephson
junctions,
using
multiple
substrates
with
without
through-silicon
vias
(TSVs).
Dolan
junctions
fabricated
on
planar
have
the
highest
yield
lowest
room-temperature
conductance
spread,
equivalent
to
∼100M
mathvariant="normal">H
mathvariant="normal">z
in
transmon
frequency.
In
TSV-integrated
substrates,
suffer
most
both
disorder,
making
Manhattan
preferable.
show
pronounced
decrease
from
wafer
center
edge,
which
we
qualitatively
capture
a
geometric
model
spatially-dependent
resist
shadowing
during
junction
electrode
evaporation.
Analysis
actual
overlap
areas
scanning
electron
micrographs
supports
model,
further
points
remnant
spatial
dependence
possibly
due
contact
resistance.