Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review

Micromachines, Journal Year: 2024, Volume and Issue: 15(11), P. 1321 - 1321

Published: Oct. 30, 2024

Lithography serves as a fundamental process in the realms of microfabrication and nanotechnology, facilitating transfer intricate patterns onto substrate, typically form wafer or flat surface. Grayscale lithography (GSL) is highly valued precision manufacturing research endeavors because its unique capacity to create customizable with varying depths intensities. Unlike traditional binary lithography, which produces discrete on/off features, GSL offers spectrum exposure levels. This enables production complex microstructures, diffractive optical elements, 3D micro-optics, other nanoscale designs smooth gradients surface profiles. plays crucial role sectors such microelectronics, MEMS/NEMS manufacturing, photonics, where precise control over feature depth, shape, intensity critical for achieving advanced functionality. Its versatility generate tailored structures make an indispensable tool various cutting-edge applications. review will delve into several lithographic techniques, particular emphasis on masked maskless methods. As these technologies continue evolve, future micro- nanostructure undoubtedly assume even greater significance

Language: Английский

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Transforming digital interaction: Integrating immersive holographic communication and metaverse for enhanced immersive experiences

Computers in Human Behavior Reports, Journal Year: 2025, Volume and Issue: 18, P. 100605 - 100605

Published: Feb. 28, 2025

Language: Английский

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Computer Science Integrations with Laser Processing for Advanced Solutions

Photonics, Journal Year: 2024, Volume and Issue: 11(11), P. 1082 - 1082

Published: Nov. 18, 2024

This article examines the role of computer science in enhancing laser processing techniques, emphasizing transformative potential their integration into manufacturing. It discusses key areas where computational methods enhance precision, adaptability, and performance operations. Through advanced modeling simulation a deeper understanding material behavior under irradiation was achieved, enabling optimization parameters reduction defects. The intelligent control systems, driven by machine learning artificial intelligence, examined, showcasing how real-time data analysis adjustments lead to improved process reliability quality. utilization computer-generated diffractive optical elements (DOEs) emphasized as means precisely beam characteristics, thus broadening application opportunities across various industries. Additionally, significance predictive analyses manufacturing effectiveness sustainability is discussed. While challenges such need for specialized expertise investment new technologies persist, this underscores considerable advantages integrating with processing. Future research should aim address these challenges, further improving quality, processes.

Language: Английский

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Exploring the functional characteristics of diffractive optical Element: A comprehensive review

Optics & Laser Technology, Journal Year: 2024, Volume and Issue: 183, P. 112383 - 112383

Published: Dec. 28, 2024

Language: Английский

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Transforming High-Resolution Imaging: A Comprehensive Review of Advances in Metasurfaces and Metalenses

Materials Today Physics, Journal Year: 2024, Volume and Issue: unknown, P. 101628 - 101628

Published: Dec. 1, 2024

Language: Английский

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