Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da) DOI Creative Commons
Mohammad S. M. Saifullah, Anil Rajak, Kevin Hofhuis

et al.

ACS Nano, Journal Year: 2024, Volume and Issue: 18(35), P. 24076 - 24094

Published: Aug. 20, 2024

Resists that enable high-throughput and high-resolution patterning are essential in driving the semiconductor technology forward. The ultimate performance of a resist lithography is limited because trade-off between resolution, line-width roughness, sensitivity; improving one or two these parameters typically leads to loss third. As patterned feature sizes approach angstrom scale, three metrics becomes increasingly hard resolve calls for fundamental rethinking chemistry. Low-molecular-mass monodispersed metal-containing resists high atom economy can provide not only very resolution but also low roughness without sacrificing sensitivity. Here we describe modular platform (molecular mass <500 Da) where molecular consists just components: metal radical initiator bonded it. This simple system amenable electron beam (EBL) extreme ultraviolet (EUVL) unites them mechanistically, giving consolidated perspective chemical processes happening during exposure. Irradiation production secondary electrons generate radicals metal. brings about an intramolecular rearrangement causes solubility switch exposed resist. We demonstrate record 1.9–2.0 nm isolated patterns 7 half-pitch dense line-space features over large area using EBL. With EUVL, 12 shown at dose 68 mJ/cm2. In both techniques, was found be ≤2 nm, value any platform, leading low-performance metric, Z factor, 0.6 × 10–8 mJ·nm3. by instrumental factors, potential level unit cell envisaged, making low-molecular-mass best poised angstrom-scale lithography.

Language: Английский

Recent advances on chalcone-based photoinitiators of polymerization DOI Creative Commons
Malika Ibrahim‐Ouali, Frédéric Dumur

European Polymer Journal, Journal Year: 2021, Volume and Issue: 158, P. 110688 - 110688

Published: Aug. 5, 2021

Language: Английский

Citations

86

Recent Advances in Type I Photoinitiators for Visible Light Induced Photopolymerization DOI

Stefanie M. Müller,

Sandra Schlögl, Tanja Wiesner

et al.

ChemPhotoChem, Journal Year: 2022, Volume and Issue: 6(11)

Published: June 27, 2022

Abstract Photopolymerization and its application in the dental, three‐dimensional (3D) printing, coating electronic industry has become increasingly popular over last decades. A huge variety of photoinitiators (PIs) photoinitiating systems (PISs) have been developed that are able to generate reactive species, e. g. radicals, radical cations, cations upon light absorption. In this Review, we focus on radical‐generating Type I PIs which undergo homolytic cleavage after irradiation with visible light. The possibility utilize electromagnetic above 400 nm for initiation polymerization reactions provides several advantages such as a lower energy demand higher curing depths pigmented systems. Recent developments based phosphorus group 14 elements well other selected concepts initiators outlined discussed within review.

Language: Английский

Citations

71

Recent advances on coumarin-based photoinitiators of polymerization DOI Creative Commons
Frédéric Dumur

European Polymer Journal, Journal Year: 2021, Volume and Issue: 163, P. 110962 - 110962

Published: Dec. 21, 2021

Language: Английский

Citations

62

Substituent effects on the photoinitiation ability of coumarin-based oxime-ester photoinitiators for free radical photopolymerization DOI
Fatima Hammoud, Nicolas Giacoletto, Guillaume Noirbent

et al.

Materials Chemistry Frontiers, Journal Year: 2021, Volume and Issue: 5(24), P. 8361 - 8370

Published: Jan. 1, 2021

In this study, a series of coumarin chromophore-based oxime-esters were designed and synthesized as visible light photoinitiators (PIs).

Language: Английский

Citations

58

Effect of Decarboxylation on the Photoinitiation Behavior of Nitrocarbazole-Based Oxime Esters DOI
Shaohui Liu, Nicolas Giacoletto, Michael Schmitt

et al.

Macromolecules, Journal Year: 2022, Volume and Issue: 55(7), P. 2475 - 2485

Published: March 30, 2022

A series of 50 oxime esters bearing various substituents were designed and synthesized as photoinitiators (48 them never before only B1 B10 reported). Good light absorption properties in the visible range observed for these esters. Some structures exhibited better photoinitiation abilities than diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide (TPO) upon exposure to a LED@405 nm. Interestingly, PIs with methyl substituent on ester group have performance others. Substituent effects investigated through molecular orbitals calculations, detection CO2, investigation generated free radicals. The results demonstrate that exert major ability via decarboxylation reaction. In addition, chemical mechanism was proposed. 3D printed objects successfully obtained by using most reactive photoinitiator, their thermal initiation behaviors several also studied (dual thermal/photochemical initiator behavior).

Language: Английский

Citations

48

Recent advances on visible light Phenothiazine-based photoinitiators of polymerization DOI
Frédéric Dumur

European Polymer Journal, Journal Year: 2022, Volume and Issue: 165, P. 110999 - 110999

Published: Jan. 15, 2022

Language: Английский

Citations

45

A review on recently proposed oxime ester photoinitiators DOI Creative Commons
Fatima Hammoud, Akram Hijazi, Michael Schmitt

et al.

European Polymer Journal, Journal Year: 2023, Volume and Issue: 188, P. 111901 - 111901

Published: Feb. 17, 2023

Language: Английский

Citations

41

High-Performance Photoinitiating Systems for LED-Induced Photopolymerization DOI Open Access
Shaohui Liu, Timur Borjigin, Michael Schmitt

et al.

Polymers, Journal Year: 2023, Volume and Issue: 15(2), P. 342 - 342

Published: Jan. 9, 2023

Currently, increasing attention has been focused on light-emitting diodes (LEDs)-induced photopolymerization. The common LEDs (e.g., LED at 365 nm and 405 nm) possess narrow emission bands. Due to their light absorption properties, most commercial photoinitiators are sensitive UV cannot be optimally activated under visible irradiation. Although many have designed for LED-induced free radical polymerization cationic polymerization, there is still the issue of mating between LEDs. Therefore, development novel photoinitiators, which could applied irradiation, significant. Many photoinitiating systems reported in past decade. In this review, some recently developed used photopolymerization, mainly 5 years, summarized categorized as Type Ⅰ Ⅱ dye-based systems. addition, properties photoinitiation efficiencies discussed.

Language: Английский

Citations

32

Recent advances on photobleachable visible light photoinitiators of polymerization DOI Creative Commons
Frédéric Dumur

European Polymer Journal, Journal Year: 2023, Volume and Issue: 186, P. 111874 - 111874

Published: Feb. 1, 2023

Language: Английский

Citations

30

The future of visible light photoinitiators of polymerization for photocrosslinking applications DOI Creative Commons
Frédéric Dumur

European Polymer Journal, Journal Year: 2023, Volume and Issue: 187, P. 111883 - 111883

Published: Feb. 11, 2023

Language: Английский

Citations

27