Cleaning mechanisms during post chemical mechanical polishing (CMP) using particle removal of surfactants via a citric acid-based solution DOI

Haoyu Du,

Renhao Liu,

Baimei Tan

et al.

Colloids and Surfaces A Physicochemical and Engineering Aspects, Journal Year: 2024, Volume and Issue: 697, P. 134428 - 134428

Published: May 31, 2024

Language: Английский

Dual impact of Nd3+ doping on CeO2 abrasives: enhancing chemical and mechanical effects in chemical–mechanical polishing DOI Creative Commons
Yesheng Zhang, Lei Hong, Jianhua Zhang

et al.

Surface Science and Technology, Journal Year: 2025, Volume and Issue: 3(1)

Published: Feb. 18, 2025

Language: Английский

Citations

0

Coupling Effect of Polishing Solution and Frictional Heat on the Surface Quality Properties of Titanium Alloy Materials DOI

Yunlong Yao,

Xiaokun Wei,

Zhankui Wang

et al.

Materials Today Communications, Journal Year: 2025, Volume and Issue: unknown, P. 112185 - 112185

Published: March 1, 2025

Language: Английский

Citations

0

Study on orthogonal optimization of process parameters for SiCp/Al composite materials by WEDM DOI
Zhou Sun, Linglei Kong,

Weining Lei

et al.

Materials and Manufacturing Processes, Journal Year: 2025, Volume and Issue: unknown, P. 1 - 12

Published: March 11, 2025

Language: Английский

Citations

0

Development and characterization of a novel alginate-based slurry and its fused silica CMP investigations DOI

Gong Lv,

Yuxi Cao,

Shengsheng Liu

et al.

Ceramics International, Journal Year: 2025, Volume and Issue: unknown

Published: March 1, 2025

Language: Английский

Citations

0

Effect of a novel alginate/5-aminovaleric acid slurry with CeO2/MoS2 abrasives on surface roughness and material removal rate of quartz glass DOI

Gong Lv,

Enqiang Hao,

Zefang Zhang

et al.

Applied Surface Science, Journal Year: 2025, Volume and Issue: unknown, P. 163096 - 163096

Published: March 1, 2025

Language: Английский

Citations

0

Quantitative analysis of the polishing performance of Wurtzite-SiC surface texture on surface quality and material removal rate DOI

Tan-Tai Do,

Phu-Cuong Le,

Te‐Hua Fang

et al.

Tribology International, Journal Year: 2024, Volume and Issue: 199, P. 110020 - 110020

Published: July 21, 2024

Language: Английский

Citations

3

Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism DOI

X. Zhu,

Juxuan Ding,

Zhangchao Mo

et al.

Applied Surface Science, Journal Year: 2024, Volume and Issue: 679, P. 161157 - 161157

Published: Sept. 3, 2024

Language: Английский

Citations

3

Effect of synergistic CeO2/MoS2 abrasives on surface roughness and material removal rate of quartz glass DOI

Gong Lv,

Shengsheng Liu,

Yuxi Cao

et al.

Ceramics International, Journal Year: 2024, Volume and Issue: unknown

Published: Sept. 1, 2024

Language: Английский

Citations

3

A novel green CeO2 polishing slurry and its chemical mechanical action mechanism for achieving atomic-level smoothing of fused silica glass surfaces DOI
Fukun Li, Bai Yang, Haixiang Hu

et al.

Colloids and Surfaces A Physicochemical and Engineering Aspects, Journal Year: 2024, Volume and Issue: unknown, P. 135892 - 135892

Published: Dec. 1, 2024

Language: Английский

Citations

3

The influence of the types of cluster composite abrasives on the performance of fixed abrasive pads in processing quartz glass DOI
Zhankui Wang,

Pengzhan Wang,

Xiaokun Wei

et al.

Materials Today Communications, Journal Year: 2024, Volume and Issue: 39, P. 108998 - 108998

Published: April 23, 2024

Language: Английский

Citations

2