Microsystems & Nanoengineering, Journal Year: 2025, Volume and Issue: 11(1)

Published: March 4, 2025

Large-area gratings play a crucial role in various engineering fields. However, traditional interference lithography is limited by the size of optical component apertures, making large-area fabrication challenging task. Here, method for fabricating laser pattern arrays with global alignment reference strategy proposed. This approach enables each area arrays, including phase, period, and tilt angle. Two are utilized: one detached from substrate, while other remains fixed to it. To achieve alignment, exposure adjusted alternating between moving beam substrate. In our experiment, 3 × regions grating array was fabricated, -1st-order diffraction wavefront measured Fizeau interferometer exhibited good continuity. technique effective efficient high accuracy across any region an on large substrates. It can also serve as common types periodic structures rotating

Language: Английский