Cleaning mechanisms during post chemical mechanical polishing (CMP) using particle removal of surfactants via a citric acid-based solution DOI

Haoyu Du,

Renhao Liu,

Baimei Tan

et al.

Colloids and Surfaces A Physicochemical and Engineering Aspects, Journal Year: 2024, Volume and Issue: 697, P. 134428 - 134428

Published: May 31, 2024

Language: Английский

Advanced polishing methods for atomic-scale surfaces: A review DOI

Zhun Luo,

Zhenyu Zhang, Feng Zhao

et al.

Materials Today Sustainability, Journal Year: 2024, Volume and Issue: 27, P. 100841 - 100841

Published: May 20, 2024

Language: Английский

Citations

21
A review on the development of ceria for chemical mechanical polishing DOI
Jiahui Ma, Ning Xu, Jie Cheng

et al.

Powder Technology, Journal Year: 2024, Volume and Issue: 444, P. 119989 - 119989

Published: June 12, 2024

Language: Английский

Citations

15
Novel ceria/graphene oxide composite abrasives for chemical mechanical polishing DOI
Chuandong Chen,

Yanying Cui,

Xiaopei Li

et al.

Ceramics International, Journal Year: 2024, Volume and Issue: 50(15), P. 26325 - 26333

Published: March 20, 2024

Language: Английский

Citations

10
Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives DOI
Xiaoxiao Zhu,

Yuziyu Gui,

Hao Fu

et al.

Tribology International, Journal Year: 2024, Volume and Issue: 197, P. 109827 - 109827

Published: May 26, 2024

Language: Английский

Citations

10
Chemical mechanical polishing on cobalt-based barrier through dual functionality of salicylhydroxamic acid between the removal of copper and corrosion inhibition DOI

Yingqi Di,

Guofeng Pan,

Song Lv

et al.

Electrochimica Acta, Journal Year: 2025, Volume and Issue: 514, P. 145689 - 145689

Published: Jan. 11, 2025

Language: Английский

Citations

1
Characterizing the contact evolution through the combination of surface roughness parameters in chemical mechanical polishing using a polyurethane polishing pad DOI
Jongmin Jeong, Yeongil Shin,

Seunghun Jeong

et al.

Wear, Journal Year: 2025, Volume and Issue: unknown, P. 205802 - 205802

Published: Jan. 1, 2025

Language: Английский

Citations

1
Crystal structure transformation and lattice impurities migration of quartz during chlorine roasting DOI Creative Commons
W. Guo, Lu Hong, Zhenyue Zhang

et al.

International Journal of Mining Science and Technology, Journal Year: 2024, Volume and Issue: unknown

Published: Nov. 1, 2024

Language: Английский

Citations

7
Preparation of SiO2@MnO2 composite abrasives and their performance in chemical-mechanical polishing of SiC substrates DOI

Ruixing Yang,

Hong Lei,

Jianhua Zhang

et al.

Ceramics International, Journal Year: 2024, Volume and Issue: 50(19), P. 34796 - 34805

Published: June 21, 2024

Language: Английский

Citations

6
Recycling and Reuse of Rare Earth Polishing Powder Waste by a Simple Gravity Settling-Acid Leaching Process DOI

X. Zhu,

Xuesong Jiang,

Juxuan Ding

et al.

Waste and Biomass Valorization, Journal Year: 2025, Volume and Issue: unknown

Published: Feb. 5, 2025

Language: Английский

Citations

0
Atomic surface of fused silica with high material removal rate produced by novel chemical mechanical polishing using composite rare earth oxides DOI
Xiaohong Chen, Zhenyu Zhang, Leilei Chen

et al.

Colloids and Surfaces A Physicochemical and Engineering Aspects, Journal Year: 2025, Volume and Issue: unknown, P. 136420 - 136420

Published: Feb. 1, 2025

Language: Английский

Citations

0